林奎至檢視原始碼討論檢視歷史
林奎至,台灣銘傳大學電子工程學系專任教師,畢業於國立成功大學電機所博士。主要專長CMOS元件物理和設計、類比積體電路設計、超大型積體電路(VLSI)設計、數位與類比訊號處理。
研究成果
論文名稱 | 作者 | 期刊名稱 | 發表日期 |
---|---|---|---|
Ferroelectric of HfO2 dielectric layer sputtered with TiN or ZrN for sandwich-like metal-insulator-metal capacitors | P. C. Juan, K. C. Lin, H. Y. Chu, Y. C. Kuo, H. W. Wang, and T. Y. Shih | Microelectronics Reliability | 2018.04 |
Leakage Current Mechanism and Effect of Y2O3 Doped with Zr High-K Gate Dielectrics | K. C. Lin, P. C. Juan, C. H. Liu, M. C. Wang, and C. H. Chou | Microelectronics Reliability | 2015.11 |
The Impacts of Contact Etch Stop Layer Thickness and Gate Height on Channel Stress in Strained N-Metal Oxide Semiconductor Field Effect Transistors | K. C. Lin, M. J. Twu, R. H. Deng, and C. H. Liu | Journal of Nanoscience and Nanotechnology | 2015.04 |