開啟主選單

求真百科

林奎至,台灣銘傳大學電子工程學系專任教師,畢業於國立成功大學電機所博士。主要專長CMOS元件物理和設計、類比積體電路設計、超大型積體電路(VLSI)設計、數位與類比訊號處理。


目錄

研究成果

論文名稱 作者 期刊名稱 發表日期
Ferroelectric of HfO2 dielectric layer sputtered with TiN or ZrN for sandwich-like metal-insulator-metal capacitors P. C. Juan, K. C. Lin, H. Y. Chu, Y. C. Kuo, H. W. Wang, and T. Y. Shih Microelectronics Reliability 2018.04
Leakage Current Mechanism and Effect of Y2O3 Doped with Zr High-K Gate Dielectrics K. C. Lin, P. C. Juan, C. H. Liu, M. C. Wang, and C. H. Chou Microelectronics Reliability 2015.11
The Impacts of Contact Etch Stop Layer Thickness and Gate Height on Channel Stress in Strained N-Metal Oxide Semiconductor Field Effect Transistors K. C. Lin, M. J. Twu, R. H. Deng, and C. H. Liu Journal of Nanoscience and Nanotechnology 2015.04

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