林奎至查看源代码讨论查看历史

林奎至，台湾铭传大学电子工程学系专任教师，毕业于国立成功大学电机所博士。主要专长CMOS元件物理和设计、类比积体电路设计、超大型积体电路(VLSI)设计、数位与类比讯号处理。

研究成果

论文名称	作者	期刊名称	发表日期
Ferroelectric of HfO2 dielectric layer sputtered with TiN or ZrN for sandwich-like metal-insulator-metal capacitors	P. C. Juan, K. C. Lin, H. Y. Chu, Y. C. Kuo, H. W. Wang, and T. Y. Shih	Microelectronics Reliability	2018.04
Leakage Current Mechanism and Effect of Y2O3 Doped with Zr High-K Gate Dielectrics	K. C. Lin, P. C. Juan, C. H. Liu, M. C. Wang, and C. H. Chou	Microelectronics Reliability	2015.11
The Impacts of Contact Etch Stop Layer Thickness and Gate Height on Channel Stress in Strained N-Metal Oxide Semiconductor Field Effect Transistors	K. C. Lin, M. J. Twu, R. H. Deng, and C. H. Liu	Journal of Nanoscience and Nanotechnology	2015.04