檢視磁控溅射镀膜的原始碼

[[File:磁控溅射镀膜.jpg|缩略图|[https://image.baidu.com/search/detail?ct=503316480&z=0&ipn=d&word=%E7%A3%81%E6%8E%A7%E6%BA%85%E5%B0%84%E9%95%80%E8%86%9C%20%20%E7%9F%A5%E4%B9%8E&step_word=&hs=0&pn=1&spn=0&di=3850&pi=0&rn=1&tn=baiduimagedetail&is=0%2C0&istype=2&ie=utf-8&oe=utf-8&in=&cl=2&lm=-1&st=-1&cs=3216746880%2C3956998691&os=3593939605%2C4040870478&simid=4271243544%2C834325078&adpicid=0&lpn=0&ln=262&fr=&fmq=1621912056423_R&fm=result&ic=&s=undefined&hd=&latest=&copyright=&se=&sme=&tab=0&width=&height=&face=undefined&ist=&jit=&cg=&bdtype=0&oriquery=&objurl=https%3A%2F%2Fgimg2.baidu.com%2Fimage_search%2Fsrc%3Dhttp%3A%2F%2Fwww.51wendang.com%2Fpic%2F4b7a5cfeb0b65e7aadd86436%2F8-810-jpg_6-1080-0-0-1080.jpg%26refer%3Dhttp%3A%2F%2Fwww.51wendang.com%26app%3D2002%26size%3Df9999%2C10000%26q%3Da80%26n%3D0%26g%3D0n%26fmt%3Djpeg%3Fsec%3D1624504067%26t%3D0999e3d04812dd1c052b59fe9ba9a82c&fromurl=ippr_z2C%24qAzdH3FAzdH3Fooo_z%26e3Bc8ojg1wg2_z%26e3Bv54AzdH3F15vAzdH3F9k0wcvujkakmcj0ww11bm9nmAzdH3Fb&gsm=2&rpstart=0&rpnum=0&islist=&querylist=&force=undefined 原图链接][https://www.51wendang.com/doc/4b7a5cfeb0b65e7aadd86436/8 来自无忧文档]]]
'''磁控溅射镀膜'''是指将涂层材料做为靶阴极，利用氩离子轰击靶材，产生阴极溅射，把靶材原子溅射到工件上形成沉积层的一种镀膜技术。

是将涂层材料做为靶阴极，利用[[氩离子轰击靶材]]，产生阴极溅射，把靶材原子溅射到工件上形成沉积层的一种[[镀膜技术]]，涂层材料一直保持[[固态]]，不形成[[熔池]]。